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Details of Grant 

EPSRC Reference: GR/R65626/01
Title: Focused Ion Beam Machining and Deposition Applications to Functional and Structural Materials Research
Principal Investigator: Cullis, Professor AG
Other Investigators:
Skolnick, Professor M Rainforth, Professor WM Ridgway, Professor K
Researcher Co-Investigators:
Professor P Houston Professor P Ivey Professor JH Jefferson
Mr P Osborne Professor JM Rodenburg Professor CR Whitehouse
Project Partners:
Boeing Defence Science and Technology Laborator Orsay Physics
Department: Electronic and Electrical Engineering
Organisation: University of Sheffield
Scheme: Standard Research (Pre-FEC)
Starts: 01 November 2001 Ends: 31 July 2005 Value (£): 326,365
EPSRC Research Topic Classifications:
Electronic Devices & Subsys. Materials Processing
Optical Devices & Subsystems
EPSRC Industrial Sector Classifications:
Electronics Aerospace, Defence and Marine
Related Grants:
Panel History:  
Summary on Grant Application Form
This proposal requests the purchase of a state-of-the-art focused ion beam (FIB) facility to provide a capability which combines -10nm control of sample ion milling with metal and insulator deposition at a resolution of -100nm. An especially important feature of the FIB system is that it also provides an electron beam with which a sample can be independently imaged without introducing unwanted surface ion damage: this allows fast control of the ion milling location with the possibility of critical adjustments during the milling process. It is planned to employ the facility to underpin an exacting programme of materials work focusing on studies of individual heterostructure MOS transistors, the characteristics of advanced cutting tools for the machining of titanium and surface structure developed during wear and thermomechanical processing. Combined with other work on a range of materials from quantum wires and dots to advanced magnetic devices, the studies will yield state-of-the-art information on both fundamental and technologically important processes.. Both the ion milling and layer deposition/etching facilities are vital for the proposed work. Numerous collaborators will be involved in the research including colleagues in four Departments at the University of Sheffield, ten other Universities, three independent laboratories and sixteen industrial companies.
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Further Information:  
Organisation Website: http://www.shef.ac.uk