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Details of Grant 

EPSRC Reference: GR/R16518/01
Title: Chemical Vapour Deposition of Transition Metal Nitrides
Principal Investigator: Carmalt, Professor C
Other Investigators:
Parkin, Professor IP
Researcher Co-Investigators:
Project Partners:
Multi-Arc (UK) Ltd Pilkington
Department: Chemistry
Organisation: UCL
Scheme: Standard Research (Pre-FEC)
Starts: 01 May 2001 Ends: 30 September 2004 Value (£): 192,368
EPSRC Research Topic Classifications:
Chemical Synthetic Methodology
EPSRC Industrial Sector Classifications:
Chemicals Manufacturing
Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
The overall aim of this proposal is to deposit early transition metal nitride (e.g. TiN, ZrN, TaN) films by chemical vapour deposition (CVD) using novel precursors. An ideal source of nitrogen would be (Me3Si)2NH or (R3Si)NH2 (R = Et, Ph) due to the potential facile loss of the silyl substituent. Therefore, novel single-source precursors to nitrides will be developed from the reaction of metal amides with (Me3Si)2NH, (R3Si)NH2 and N(SiMe3)3. The formation of nitrides via single-source LPCVD (Low Pressure CVD) methodology will be investigated including detailed film growth studies and characterisation. In addition, the LPCVD and atmospheric pressure CVD (APCVD) of nitride films will be studied via dual-source reactions between metal amides (e.g. Ti(NMe2)4) or volatile metal halides and (Me3Si)2NH or (R3Si)NH2. Films will be grown on a variety of substrates and characterised by XPS, SEM/EDXA, glancing angle-XRD, reflectance and absorbance measurements.
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