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Details of Grant 

EPSRC Reference: EP/F008961/1
Title: Quantum etch plasma simulation
Principal Investigator: Tennyson, Professor J
Other Investigators:
Researcher Co-Investigators:
Project Partners:
Surface Technology Systems Plc
Department: Physics and Astronomy
Organisation: UCL
Scheme: Follow on Fund
Starts: 05 August 2007 Ends: 04 September 2008 Value (£): 93,686
EPSRC Research Topic Classifications:
Scattering & Spectroscopy
EPSRC Industrial Sector Classifications:
Information Technologies
Related Grants:
Panel History:
Panel DatePanel NameOutcome
03 Apr 2007 Follow on Fund 4 Announced
Summary on Grant Application Form
The project will produce a prototype Quantum-Etch system: a plasma etching model based on accurate quantum models. This etching program will allow academic and industrial researchers to pre-test major design changes in etching systems. The consequence will be a major efficiency gain for the semiconductor industry in designing industrial etching chambers allowing for the most suitable designs to be quickly identified and moved on to lab testing. Project outputs will include a Requirements Analysis following customer interviews, Development Roadmap, Prototype Quantum-Etch system and a detailed Business Plan which will be used to raise further finance for development and marketing.
Key Findings
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Potential use in non-academic contexts
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Impacts
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Summary
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