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Details of Grant 

EPSRC Reference: EP/C519795/1
Title: Selective Laser Melting of high aspect ration 3D Microelectromechanical (MEM) Devices and Components - An Engineering of Functional Materials Proposal
Principal Investigator: Chalker, Professor PR
Other Investigators:
Sutcliffe, Professor CJ Taylor, Professor S Fox, Dr P
Researcher Co-Investigators:
Project Partners:
Department: School of Engineering
Organisation: University of Liverpool
Scheme: Standard Research (Pre-FEC)
Starts: 01 March 2005 Ends: 31 August 2006 Value (£): 99,851
EPSRC Research Topic Classifications:
Materials Characterisation Microsystems
EPSRC Industrial Sector Classifications:
Aerospace, Defence and Marine Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
The advent of silicon-based micro-electro-mechanical systems (MEMS) has developed out of processes developed for manufacturing essentially two-dimensional (2D) integrated circuits. In order to extend MEM technologies to 3D applications such as microfuidic valves, inkjet nozzles, projector micro-mirrors and others applications, high aspect ratio patterning techniques were developed such as LIGA and X-ray photoresist processing. With these techniques MEM structures of 100's micrometers thickness can be produced. To extend this further alternative methods are required, particularly if full 3D structures in materials other than silicon are to be designed and manufactured. This proposal addresses the lack of manufacturing routes for full 3D on chip MEMS structures by fusing existing research in 4 distinct areas namely silicon based functional material fabrication, the manufacture of 3D micro components by Selective Laser Melting (SLM) the production of metallic constructs from multi-material powders and the production of micro electronic devices.
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Organisation Website: http://www.liv.ac.uk