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Researcher Details
 
Name: Professor S Taylor
Organisation: University of Liverpool
Department: Electrical Engineering and Electronics
Current EPSRC-Supported Research Topics:

Current EPSRC Support
There is no current EPSRC Support
Previous EPSRC Support
EP/M029425/1 'Creating a Stink - Investigating Olfactory Transport Streams'(C)
EP/K016202/1 Ambient Processing of Polymeric Web: Advanced Diagnostics and Applications(C)
EP/F008848/1 Microengineering of Quadrupole Mass Spectrometers using RP techniques(P)
EP/E048560/1 Atomic layer deposition of Hafnium-nitride and Lanthanide nitrides(C)
EP/D068606/1 Liquid injection ALD of Cp- based precursors for deposition of dielectric materials(C)
EP/C003101/1 Performance, degradation and defect structure of MOS devices using high-k materials as gate dielectrics(R)
EP/C519795/1 Selective Laser Melting of high aspect ration 3D Microelectromechanical (MEM) Devices and Components - An Engineering of Functional Materials Proposal(C)
GR/S76632/01 MOCVD of Lanthanide Oxides and Silicates for Microelectronics Applications(C)
GR/S07995/01 SF6 Emission Monitoring with Mass Spectrometry(C)
GR/R97092/01 Carbon Based Electronics: A National Consortium(C)
GR/R17416/01 Integration of Ill-Nitride Materials With Silicon Microsystems Technologies(C)
GR/M93741/01 0.03UM VERTICAL SHALLOW TRENCH CMOS TECHNOLOGY (VST-CMOS)(C)
GR/N19564/01 DEVELOPMENT AND EXPLOITATION OF A COMMERCIAL PLASMA OXIDATION SYSTEM(C)
GR/M69814/01 PLASMAQUAD: MICROMACHINED MASS SPECTROMETER FOR PLASMA CHARACTERISATION AND CONTROL(P)
GR/M31279/01 SILICON MICROENGINEERED PLATFORMS FOR ARRAYED QUADRUPOLE MASS SPECTROMETERS(P)
GR/L28159/01 RELIABILITY DESIGN FOR ULTRA-SHORT GATE CMOS TECHNOLOGIES(P)
GR/K54755/01 MICROMACHINED QUADRUPOLE MASS SPECTROMETER(P)
GR/K56834/01 INVESTIGATION OF THE INTERGRATED DESIGN OF A SMALL ELECTRICAL MACHINE AND POWER ELECTRONIC DRIVE(C)
GR/J77979/01 CHARACTERISATION OF DIELECTRICS FOR LOW POWER CMOS CIRCUITS AND SINGLE ELECTRON ELECTRONICS(P)
GR/J47323/01 ELECTRON TRANSPORT IN ADVANCED SILICON STRUCTURES(C)
GR/H65733/01 DIELECTRICS FOR ADVANCED CMOS GATES(P)
GR/F36682/01 DIELECTRICS FOR ADVANCED CMOS GATES(P)
GR/F42782/01 POROUS SILICON (FIPOS)DEVELOPMENT(C)
GR/F35180/01 MATERIALS PROCESSING FOR ADVANCED SOI SUBSTRATES(C)
Key: (P)=Principal Investigator, (C)=Co-Investigator, (R)=Researcher Co-Investigator