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Details of Grant 

EPSRC Reference: GR/S76632/01
Title: MOCVD of Lanthanide Oxides and Silicates for Microelectronics Applications
Principal Investigator: Jones, Professor A.C.
Other Investigators:
Chalker, Professor PR Taylor, Professor S Aspinall, Dr HC
Researcher Co-Investigators:
Project Partners:
SAFC Hitech
Department: Chemistry
Organisation: University of Liverpool
Scheme: Standard Research (Pre-FEC)
Starts: 04 May 2004 Ends: 03 October 2007 Value (£): 255,912
EPSRC Research Topic Classifications:
Materials Characterisation Materials Synthesis & Growth
EPSRC Industrial Sector Classifications:
Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
This is a multidisciplinary project with the ultimate objective of developing novel precursor materials and process technologies for the manufacture of next generation gate dielectric thin films. The principal aims of the project are therefore to develop a range of volatile rare-earth silylamide and alkoxide precursors for the liquid injection CVD of lanthanide metal oxides and silicates, and to assess the physico-chemical and electronic properties of the resulting high k dielectric films for MOS applications.
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Further Information:  
Organisation Website: http://www.liv.ac.uk