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Details of Grant 

EPSRC Reference: GR/R57287/01
Title: Fine Pitch 3-D Photolithography Ffestiniog .
Principal Investigator: Seed, Dr NL
Other Investigators:
Ivey, Professor P
Researcher Co-Investigators:
Dr G Williams
Project Partners:
Shipley Europe Ltd Xaar Plc
Department: Electronic and Electrical Engineering
Organisation: University of Sheffield
Scheme: Standard Research (Pre-FEC)
Starts: 01 August 2001 Ends: 30 April 2002 Value (£): 45,608
EPSRC Research Topic Classifications:
Manufacturing Machine & Plant
EPSRC Industrial Sector Classifications:
Electronics Creative Industries
Related Grants:
Panel History:  
Summary on Grant Application Form
The study aims to assess the feasibility of using an electrode-depositable photoresist to pattern fine-pitch electrical connections onto three-dimensional surfaces.The work would involve first optimising the patterning process and then assessing its reliability on large substrates. As a case study we will assess the potential for plating some large (230x18mm) printheads which contain over 3000 piezo-electric actuators, each with a step height of 350um. For a successful process every actuator must be connected, hence the case study will provide a significant test for the technology.We will also investigate the limits of step-height versus resolution and consider some speculative methods for overcoming the Fresnel diffraction limit by the use, for exampl, of phase contrast masks.
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Organisation Website: http://www.shef.ac.uk