| EPSRC Reference: |
GR/R07004/01 |
| Title: |
University of Sussex Meso/Nano Lithographic Facility |
| Principal Investigator: |
Clark, Professor T |
| Other Investigators: |
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| Researcher Co-Investigators: |
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| Project Partners: |
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| Department: |
Sch of Engineering and Design |
| Organisation: |
University of Sussex |
| Scheme: |
Strategic Equipment Initiative |
| Starts: |
01 September 2000 |
Ends: |
31 May 2002 |
Value (£): |
483,470
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| EPSRC Research Topic Classifications: |
| Electronic Devices & Subsys. |
Optical Devices & Subsystems |
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| EPSRC Industrial Sector Classifications: |
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| Panel History: |
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Summary on Grant Application Form |
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The proposed facility will allow us to create a wide variety of microstructures down to the level of tens of nanometers. At Sussex there are a number of world renowned groups for whom access to nanofabrication will greatly enhance their competitiveness and ability to generate collaborative programmes.Specifically, it is intended to pattern and fabricate:* Atom waveguides for the Atom Optics and Optoelectronics groups* 1D and 2D arrays of thin film electrodes which can be interfaced with carbon nanotubes for the Fullerene group and with neural networks (artificial and biological) for the Neurosciences groups* thin film superconducting circuits for the Physical Electronics group* thin film sensors for applications by the Space Science, thermofluids, Instrumentation and Bio-optics groups and for array imaging of neural networks.In addition to these individual requirements, the emphasis on meso/nano lithography will foster multidisciplinary programmes, both within Sussex and including external collaborators, on quantum technologies, artificial structures in the neurosciences and novel sensor systems.The key item of equipment, essential for creating structures down to the nanometric level, is a modern electron beam lithography system with a laser positioning stage. This, complimented by the requested and existing fabrication equipment will allow the creation of the facility as proposed. We note that a meso/nanon fabrication facility was the subject of a JIF bid to round 2, held over to round 3, but rejected due to lack of funds.
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Key Findings |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
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| Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
| Summary |
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| Date Materialised |
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Sectors submitted by the Researcher |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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| Project URL: |
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| Further Information: |
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| Organisation Website: |
http://www.sussex.ac.uk |