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Details of Grant 

EPSRC Reference: GR/M84756/01
Title: MASKED IRRADIATION DAMAGE FOR MANUFACTURABLE SUPERCONDUCTING DEVICES AND NANOSCALE ELECTRONICS
Principal Investigator: Blamire, Professor M
Other Investigators:
Tarte, Dr EJ Moore, Dr DF
Researcher Co-Investigators:
Project Partners:
Department: Materials Science & Metallurgy
Organisation: University of Cambridge
Scheme: Standard Research (Pre-FEC)
Starts: 01 October 1999 Ends: 30 September 2002 Value (£): 152,531
EPSRC Research Topic Classifications:
Materials Processing
EPSRC Industrial Sector Classifications:
No relevance to Underpinning Sectors Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
Focused electron beam, irradiation (FEBI) has enabled us to create a range of complex devices and circuits in a high critical temperature superconductors. We have begun developing masked ion irradiation damage (MID) as a manufacturable alternative; in the MID process ions degrade the superconductor in regions previously exposed in a mask layer by high definition lithography. The collaborative programme proposed here has the principal aim of developing nanoscale irradiation technology to fabricate superconducting devices through a complete understanding of the irradiation damage process. We have developed a unique in-situ measurement system which will enable the characterisation of materials and devices during implantation. By extending the techniques developed to other materials we will explore the potential for fabrication of nano-scale magnetic and semiconducting structures. The superconducting system provides a very accurate test of existing models of scattering and damage processes, so that work performed during this programme on developing improved masking techniques for high lateral resolution ion implantation will be of direct benefit to workers in semiconductor and other device fields.
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Organisation Website: http://www.cam.ac.uk