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EPSRC Reference: GR/M69678/01
Title: TOWARDS A FUNDAMENTAL UNDERSTANDING OF PLASMA-ASSISTED PHYSICAL VAPOUR DEPOSITION
Principal Investigator: Fancey, Dr KS
Other Investigators:
Matthews, Professor A Leyland, Dr A
Researcher Co-Investigators:
Project Partners:
Hiden Analytical Ltd Tecvac Ltd
Department: Engineering
Organisation: University of Hull
Scheme: Standard Research (Pre-FEC)
Starts: 01 February 2000 Ends: 30 April 2003 Value (£): 268,604
EPSRC Research Topic Classifications:
Materials Characterisation Plasmas - Technological
EPSRC Industrial Sector Classifications:
Manufacturing No relevance to Underpinning Sectors
Related Grants:
Panel History:  
Summary on Grant Application Form
This research aims to deliver information about from PAPVD coating studies by considering the energy and reactivity of arriving species. EB evaporation allows vapour emission control to be decoupled from the discharge parameters and, in contrast with sputter PAPVD, coating growth is unaffected by reflected energetic argon atoms. We intend to exploit these properties of EB evaporation, to support UK equipment manufacturers and coating/treatment providers by obtaining information about both EB and sputter deposition to elucidate mechanisms common to all PAPVD processes. Direct studies of PAVD discharges will be made principally by mass/energy analysis of species bombarding the substrate (cathode), by spatially-resolved OES, and by cathode sheath thickness measurement under static and pulsed plasma conditions. Coatings studies by SEM, EDX, XRD, XRF, EPMA and XPS will provide further information on the role of Penning effects in ionisation enhancement and on opportunities for processing at lower temperatures whilst maintaining coating properties. This research meets the TPI priorities through (i) in-house modelling, (ii) OES process monitoring/characterisation, mass/energy analysis and cluster studies, (iii) OES measurement/diagnostics/control, mass/energy analysis and coating studies, (iv) pulsed-bias coating, with OES for cluster diagnostics, and (v) chemical aspects - 'reactive' deposition.
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Organisation Website: http://www.hull.ac.uk