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EPSRC Reference: GR/M41223/01
Title: A NEW APPROACH TO THE PRODUCTION OF HIGH RESOLUTION X-RAY MASKS
Principal Investigator: Cairns, Professor JA
Other Investigators:
Fitzgerald, Professor AG Thomson, Dr J
Researcher Co-Investigators:
Project Partners:
Compugraphics International Ltd
Department: Electronic Engineering and Physics
Organisation: University of Dundee
Scheme: Standard Research (Pre-FEC)
Starts: 01 April 1999 Ends: 31 March 2002 Value (£): 195,379
EPSRC Research Topic Classifications:
Materials Processing
EPSRC Industrial Sector Classifications:
Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
Current methods of photomask manufacture which rely on imported raw material from Japan, will have to adapt in order to produce the x-ray masks which will be required for future high density integrated circuits. We propose here a means to achieve this by using electro-induced decomposition of a novel range of organometallic compounds on to x-ray-transparent membranes. We have demonstrated the feasibility of this approach and plan to evaluate the performance of the x-ray masks by using the laser plasma x-ray source at the Rutherford Appleton Laboratory.
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Organisation Website: http://www.dundee.ac.uk