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Details of Grant 

EPSRC Reference: GR/M16344/01
Title: ADVANCED GRATING INSCRIPTION TECHNOLOGY & DEVICES USING ELECTRON-BEAM GENERATED PHASE MASKS
Principal Investigator: De La Rue, Honorary Professor R
Other Investigators:
Aitchison, Professor S Thoms, Dr S Laybourn, Professor PJR
Researcher Co-Investigators:
Project Partners:
Nortel
Department: Electronics and Electrical Engineering
Organisation: University of Glasgow
Scheme: Standard Research (Pre-FEC)
Starts: 01 September 1998 Ends: 31 May 2002 Value (£): 239,570
EPSRC Research Topic Classifications:
Optical Devices & Subsystems
EPSRC Industrial Sector Classifications:
Communications
Related Grants:
Panel History:  
Summary on Grant Application Form
This programme seeks to advance the capabilities of device technology based on UV-inscription of Bragg gratings in fibres and planar silica waveguides. The work centres on extending the inscription methodologies based on e-beam generated phase masks and scanned UV exposure used separately and in combination. New phase masks will be realised incorporating complex fringe patterns containing phase steps, period chirps, non-uniform mark-space ratios, and arrays of features with precisely defined separations. The device performance limiting factors will be investigated. The fabrication of very long periodic and aperiodic gratings and grating arrays using scanned phase mask exposure and stitching will be investigated using novel phase masks and scanning techniques. Fabrication techniques for multiple coherent grating-based resonators will be established. All of these techniques will be used to produce and demonstrate several novel devices including high-performance transmission filters, picosencond pulse processing devices, RF signal processing arrays, and high-sensitivity sensor elements. The polarisation properties of long grating structures will be investigated: techniques both for removing and for enhancing polarisation sensitivity will be examined for device applications. Application of phase mask inscription techniques will be extended into planar silica waveguide devices.
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Organisation Website: http://www.gla.ac.uk