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Details of Grant 

EPSRC Reference: GR/L63280/01
Title: DEVELOPMENT OF REFRACTORY METAL COATINGS BY PACK CEMENTATION TO COMBAT HIGH TEMPERATURE SULPHIDATION
Principal Investigator: Datta, Professor P
Other Investigators:
Jenkin, Dr D
Researcher Co-Investigators:
Project Partners:
Department: Sch of Engineering & Technology
Organisation: Northumbria, University of
Scheme: Standard Research (Pre-FEC)
Starts: 04 March 1998 Ends: 03 March 2001 Value (£): 222,604
EPSRC Research Topic Classifications:
Materials Processing
EPSRC Industrial Sector Classifications:
Manufacturing
Related Grants:
Panel History:  
Summary on Grant Application Form
This Project will address issues relating to the process of deposition of a series of novel coatings using the pack cementation technique and study the formation and nature of the coatings produced and the response of these coatings to bioxidant (sulphur-containing) environments in terms of their scaling behaviour and degradation pattern.It is intended to use Inconel 738, Inconel 939 and CMX-4 superalloys as substrates in the development of refractory metal diffusion coatings. As the first step of the Programme it is intended to achieve the deposition of single refractory metals (Nb and Mo). The Programme will be extended to study the co-deposition of refractory metals with Al. The aim is to study the deposition of these coating systems in terms of the thermodynamic and kinetic factors involved by both theoretical calculations and experimental work. Finally it is proposed to investigate the possibility of incorporating reactive elements (e.g. Hf,Y) by a single step, co-deposition process or by a two step sequential deposition process. Systematic corrosion studies on the coated samples will be carried out in H2/H2O/H2S atmospheres at temperatures in the range of 700-1000C providing atmospheres of low oxygen and high sulphur activities. Degradation kinetics will be assessed gravimetrically on a continuous or discontinuous basis and the process of scale development and scale breakdown will be followed using a series of electron and optical devices.
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