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Details of Grant 

EPSRC Reference: GR/J56363/01
Title: AN ION BEAM CRYSTALLOGRAPHY (MEIS) FACILITY FOR STUDYING SURFACE AND INTERFACE STRUCTURE
Principal Investigator: Armour, Professor D
Other Investigators:
van den Berg, Professor J
Researcher Co-Investigators:
Project Partners:
Department: Electronic and Electrical Engineering
Organisation: University of Salford
Scheme: Standard Research (Pre-FEC)
Starts: 14 June 1994 Ends: 13 June 1997 Value (£): 6,583
EPSRC Research Topic Classifications:
Materials Characterisation
EPSRC Industrial Sector Classifications:
Related Grants:
Panel History:  
Summary on Grant Application Form
The project is concerned with establishing a new material MEIS facility at Daresbury Laboratory. The structure analysis capabilities of this technique are uniquely capable of evaluating the crystal quality and defect distributions in very near surface layers of solids. Detailed studies of ion beam deposition and low energy ion implantation and etching will be undertaken. Initially the combined implantation/MEIS Facility at Salford will be used to give the R/A experience of the MEIS technique. Following installation of the new facility, with which Salford will be involved, the analytical work will be carried out at Daresbury using the much more sensitive equipment being installed as part of the overall project. The study is aimed at the development of a detailed understanding of the fundamental processes occurring during the interaction of low energy ions with solid surfaces during film growth, implantation and etching.
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Further Information:  
Organisation Website: http://www.salford.ac.uk