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Details of Grant 

EPSRC Reference: GR/J27585/01
Title: EVALUATION OF THE SPUTTERING PROCESS IN RELATION TO THE IR EMISSIVITY OF A1 THIN FILMS
Principal Investigator: Somekh, Dr R
Other Investigators:
Researcher Co-Investigators:
Project Partners:
Pre Nexus Migration
Department: Materials Science & Metallurgy
Organisation: University of Cambridge
Scheme: Standard Research (Pre-FEC)
Starts: 01 February 1994 Ends: 31 January 1995 Value (£): 38,820
EPSRC Research Topic Classifications:
Materials Processing
EPSRC Industrial Sector Classifications:
Communications
Related Grants:
Panel History:  
Summary on Grant Application Form
This proposal addresses the issue of high purity metal thin films produced by sputtering. We will apply our considerable success in UHV getter sputtering to the deposition of aluminium films for optical applications. Recent unpublished studies have revealed that the infra-red emissivity is strongly dependent on the purity and sputtering conditions of the A1 films. Such low emissivity films are a prerequisite to good signal to noise performance of IR telescopes and satellite communication systems and from a cost point of view it is desirable to coat large scale facilities using the sputtering technique. However, to date there has been no detailed study of the IR performance of sputtered films. This project will involve the deposition of a number of films under different conditions which will be assessed structurally and electrically by means of d.c resistivity. This information will be very useful in appraising the ease with which the technique may be applied to the coating of small and large mirrors whilst at the same time giving insight into the sputter deposition process involved in producing high purity films.
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Organisation Website: http://www.cam.ac.uk