EPSRC logo

Details of Grant 

EPSRC Reference: GR/L90347/01
Title: THE INVESTIGATION & EXPLOITATION OF METAL ION SPUTTER DEPOSITION USING AN RF INDUCTIVELY COUPLED PLASMA
Principal Investigator: Barber, Professor Z
Other Investigators:
Evetts, Professor J
Researcher Co-Investigators:
Project Partners:
Department: Materials Science & Metallurgy
Organisation: University of Cambridge
Scheme: Standard Research (Pre-FEC)
Starts: 21 September 1998 Ends: 20 September 2000 Value (£): 112,770
EPSRC Research Topic Classifications:
Materials Processing Plasmas - Technological
EPSRC Industrial Sector Classifications:
No relevance to Underpinning Sectors
Related Grants:
Panel History:  
Summary on Grant Application Form
Metal Ion Sputter Deposition (MISD) is a new technique which uses an inductively coupled rf plasma to ionise the spattered atoms from a conventional magnetron target. These ions are then drawn towards a growing film with a dc bias, giving a flux of energetic depositing particles, with well specified and controllable energies. The possibility of depositing films and coatings with up to 90% of the depositing species as ions, with energies controllable up to 150ev offers a remarkable opportunity to engineer film growth. Examples are: in situ surface cleaning prior to film deposition; increased film densities; control of intrinsic stress and microstructures; reduced growth temperatures for compound film deposition; the formation of sharp interfaces between layers. Vias with high aspect ratios may be effectively filled using the flux of high energy species which impinge at near normal incidence. We will study the plasma processes which control the ionisation of the depositing species, and the influence of the process parameters. We will investigate the influence of this ion bombardment on film growth, leading to further development and optimisation of a range of film deposition, including alloys, compounds, heterostructures and multilayers.
Key Findings
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
Potential use in non-academic contexts
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
Impacts
Description This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
Summary
Date Materialised
Sectors submitted by the Researcher
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
Project URL:  
Further Information:  
Organisation Website: http://www.cam.ac.uk