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Details of Grant 

EPSRC Reference: GR/L83349/01
Title: A STUDY OF AN ARGON/CHLORINE INDUCTIVELY COUPLED PLASMA FOR PLASMA ETCH APPLICATIONS
Principal Investigator: Maguire, Professor P
Other Investigators:
Laverty, Dr S Laverty, Dr S
Researcher Co-Investigators:
Project Partners:
Department: School of Engineering
Organisation: University of Ulster
Scheme: Standard Research (Pre-FEC)
Starts: 14 December 1998 Ends: 13 December 2001 Value (£): 96,909
EPSRC Research Topic Classifications:
Plasmas - Technological
EPSRC Industrial Sector Classifications:
Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
In a typical technological plasma there exists a huge parameter space with many intermediate stages between input and output. Given the wide range of processes, applications and hence plasma chemistry used in technological plasmas, it is necessary to define a generic plasma process which represents the important characteristics of the processes. In the case of etching we have chosen a halogen, chlorine, in an increasingly important plasma, an inductively coupled plasma. We have chosen an argon/chlorine mixture so that we can relate some measurements to the inert gas baseline. The correlation of the process quality with the measured chlorine negative ion and atom densities will be investigated. The negative ion density will be determined using a novel absorption technique, the atom density will be measured using laser induced fluorescence and species arrival/interaction with various substrates will be determined via mass-energy analysis. This will provide benchmark measurements for evaluation of computer-based models of the process. They will also allow an evaluation of the use of absorption techniques for process control.
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Organisation Website: http://www.ulst.ac.uk