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Details of Grant 

EPSRC Reference: GR/K30520/01
Title: GRATINGS AND AMPLIFIERS FABRICATED IN PLANAR SIO2 STRUCTURES USING ION IMPLANTATION
Principal Investigator: Weiss, Professor B
Other Investigators:
Researcher Co-Investigators:
Project Partners:
BT Nortel
Department: Sch of Electronics & Physical Sciences
Organisation: University of Surrey
Scheme: Standard Research (Pre-FEC)
Starts: 01 October 1995 Ends: 31 December 1997 Value (£): 106,365
EPSRC Research Topic Classifications:
Optical Devices & Subsystems
EPSRC Industrial Sector Classifications:
Communications
Related Grants:
Panel History:  
Summary on Grant Application Form
The aim of this project is to fabricate optical devices and optical integrated circuits in planar SiO2 waveguide structures for use in communications and other signal processing applications. The devices to be developed here are Bragg gratings for wavelength filtering and optical amplifiers for signal regeneration. In addition, the process developed here will be of use for the fabrication of passive and active optical integrated circuits on a single substrate using the photosensitive characteristics of Ge or proton implanted SiO2, which are also used here to fabricate the Bragg grating filters. Ion implantation is a particularly useful process to be used here as it is particularly well suited to the introduction of the required impurities into the planar substrate at the required locations to facilitate the fabrication of optical integrated circuits which would contain both passive devices, such as couplers and filters, and active devices, such as amplifiers. Also, the use of an excimer laser for the exposure of the photosensitive waveguide structures is a relatively simple fabrication step for the fabrication of optical devices in SiO2 and could be used to great advantage for the fabrication of optical integrated circuits in SiO2.
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Summary
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Organisation Website: http://www.surrey.ac.uk