EPSRC Reference: |
GR/J56363/01 |
Title: |
AN ION BEAM CRYSTALLOGRAPHY (MEIS) FACILITY FOR STUDYING SURFACE AND INTERFACE STRUCTURE |
Principal Investigator: |
Armour, Professor D |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Electronic and Electrical Engineering |
Organisation: |
University of Salford |
Scheme: |
Standard Research (Pre-FEC) |
Starts: |
14 June 1994 |
Ends: |
13 June 1997 |
Value (£): |
6,583
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EPSRC Research Topic Classifications: |
Materials Characterisation |
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EPSRC Industrial Sector Classifications: |
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Related Grants: |
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Panel History: |
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Summary on Grant Application Form |
The project is concerned with establishing a new material MEIS facility at Daresbury Laboratory. The structure analysis capabilities of this technique are uniquely capable of evaluating the crystal quality and defect distributions in very near surface layers of solids. Detailed studies of ion beam deposition and low energy ion implantation and etching will be undertaken. Initially the combined implantation/MEIS Facility at Salford will be used to give the R/A experience of the MEIS technique. Following installation of the new facility, with which Salford will be involved, the analytical work will be carried out at Daresbury using the much more sensitive equipment being installed as part of the overall project. The study is aimed at the development of a detailed understanding of the fundamental processes occurring during the interaction of low energy ions with solid surfaces during film growth, implantation and etching.
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Key Findings |
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Potential use in non-academic contexts |
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Impacts |
Description |
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Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
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Project URL: |
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Further Information: |
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Organisation Website: |
http://www.salford.ac.uk |