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Details of Grant 

EPSRC Reference: GR/H97420/01
Title: THE DEPOSITION OF OXIDE-METAL THIN FILMS AND HETEROSTRUCTURES
Principal Investigator: Evetts, Professor J
Other Investigators:
Leake, Dr JA
Researcher Co-Investigators:
Project Partners:
Department: Materials Science & Metallurgy
Organisation: University of Cambridge
Scheme: Standard Research (Pre-FEC)
Starts: 01 March 1994 Ends: 31 July 1997 Value (£): 391,624
EPSRC Research Topic Classifications:
Materials Characterisation Materials Processing
EPSRC Industrial Sector Classifications:
Construction
Related Grants:
Panel History:  
Summary on Grant Application Form
After 20 years of studying the growth of thin films of refractory metals and more lately oxides we feel that it is timely to embark on a new, ambitious and far reaching project to take us into the 21st century. Over this time we have gained considerable understanding of the balance between kinetic and thermodynamic driving forces in the production of man made metallurgical phases, multilayers and heterostructures based on metals and oxides separately. This experience leads us to believe that much sharper interfaces between oxides and metals than at present, can be achieved by using a novel oxide deposition system based on a machine which uses a pulsed gas supply to a standard laser ablation system combined with our existing knowhow of metal deposition using the UHV getter sputter process. The thrust of this project will be a study of the growth of epitaxial thin films of oxides in general but in particular grown on metals. The nanoscale heterostructures which will result will, we believe, play a role in the device engineering of the future in which a variety of 'active' materials, be they magnetoresistive, piezo-electric, superconducting or magnetic will be incorporated.
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Organisation Website: http://www.cam.ac.uk