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Details of Grant 

Capital costs for equipment are added to the institutional equipment account of the holding institution. Institutional equipment accounts therefore indicate the cumulative amount awarded to that institution. Recurrent costs directly associated with equipment are awarded through a separate grant. For a full record of awards made by the EPSRC Equipment Business Case panels see: https://epsrc.ukri.org/research/ourportfolio/themes/researchinfrastructure/subthemes/equipment/supported/

EPSRC Reference: EP/L02263X/1
Title: University of Surrey- Equipment Account
Principal Investigator: Sampson, Professor DD
Other Investigators:
Researcher Co-Investigators:
Project Partners:
National Physical Laboratory Tata Steel Tetreon Technologies Ltd
Department: ATI Electronics
Organisation: University of Surrey
Scheme: Standard Research - NR1
Starts: 28 July 2014 Ends: 27 July 2024 Value (£): 3,378,171
EPSRC Research Topic Classifications:
EPSRC Industrial Sector Classifications:
Related Grants:
Panel History:
Panel DatePanel NameOutcome
05 Dec 2013 EPSRC Equipment Business Case - December 2013 Announced
Summary on Grant Application Form
The industrial adoption of graphene requires large area, high quality material. In order to produce the necessary material on substrates of choice, we wish to use our patented photo-thermal chemical vapour deposition (PT-CVD) system. PT-CVD uses a high intensity optical source to efficiently couple energy to grow high quality graphene on specially engineered catalyst substrates.

In relation to this Strategic Equipment bid the principal equipment requested is a photo-thermal chemical vapour deposition (PT-CVD) system from Thermco-Tetreon Technology. The system comprises an in-situ catalyst deposition system (to avoid oxidation and contamination) and a dedicated growth chamber capable of growth on 100 mm sized substrates, a bespoke rapid optical growth stabilisation array, in-situ Raman monitoring, residual gas analysis system and an AFM with Kelvin probe. The photo-thermal energy for growth is delivered from the rapid-growth stabilisation array consisting of high power optical sources, which can provide temperatures in excess of 1000C at the reaction front, whilst the substrate remains below 450C, compatible with CMOS integration. For both process control and further development the PT-CVD system will have an ancillary atomic force microscope, capable of scanning over large areas at high frame rates and high resolution to provide fast, accurate metrology of the graphene product. Also included is an in-situ Raman mapping system and residual gas analysis which will provide unique insight into the science of catalytic graphene growth as well as for quality control.

The principal PT-CVD graphene growth system, its rapid growth catalyst stabilisation unit, the ancillary quality control and in-situ growth monitoring equipment should be considered as a single unit system in order for us to develop this strategic material growth process for the establishment of electronic grade material for the UK and beyond.

Key Findings
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Potential use in non-academic contexts
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Description This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
Date Materialised
Sectors submitted by the Researcher
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Project URL:  
Further Information:  
Organisation Website: http://www.surrey.ac.uk